Abstract
Thin p-GaInP2 films were tested 24 h in pH1 NH 4NO3 solution at AM 1.5 G, and compared to that tested in 3 M H2SO4. Optical, SEM and EDX investigations confirmed that the surface of the tested sample in pH1 NH4NO3 was kept almost as that of an as-received one, while the sample tested in 3 M H 2SO4 experienced extensive corrosion via selective dissolution of Ga. ICP analysis confirmed the very low dissolution of p-GaInP2 in pH1 NH4NO3 solution, compared to that in 3 M H2SO4. The GaInP2 sample tested in pH1 NH4NO3 solution had an XPS depth profile almost identical to that of an as-grown sample, we speculate that absorbed NH 3 on the semiconductor surface could be responsible for the observed corrosion inhibition. Thus, the p-GaInP2 should last much longer when working in pH1 NH4NO3 solution, due to this inhibiting effect. This result shows promise toward meeting US DOE's 2013 goal of 8% STH efficiency for 1000 h duration.
Original language | American English |
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Pages (from-to) | 14009-14014 |
Number of pages | 6 |
Journal | International Journal of Hydrogen Energy |
Volume | 37 |
Issue number | 19 |
DOIs | |
State | Published - Oct 2012 |
NREL Publication Number
- NREL/JA-5600-54061
Keywords
- GaInP2
- photoelectrochemistry
- SEM
- stability
- XPS