Thermal Activation of Deep Oxygen Defect Formation and Hydrogen Effusion in Hydrogenated Nanocrystalline Silicon Thin Films

Research output: Contribution to conference › Paper

Original language	American English
Pages	002995-003000
Number of pages	6
DOIs	https://doi.org/10.1109/pvsc.2011.6186574
State	Published - 2011
Event	37th IEEE Photovoltaic Specialists Conference (PVSC '11) - Seattle, Washington Duration: 19 Jun 2011 → 24 Jun 2011

Conference	37th IEEE Photovoltaic Specialists Conference (PVSC '11)
City	Seattle, Washington
Period	19/06/11 → 24/06/11

NREL Publication Number

@conference{8f5e9fa0286f4c3a8dbea28c347b3209,

title = "Thermal Activation of Deep Oxygen Defect Formation and Hydrogen Effusion in Hydrogenated Nanocrystalline Silicon Thin Films",

author = "NREL",

year = "2011",

doi = "10.1109/pvsc.2011.6186574",

language = "American English",

pages = "002995--003000",

note = "37th IEEE Photovoltaic Specialists Conference (PVSC '11) ; Conference date: 19-06-2011 Through 24-06-2011",

}

TY - CONF

T1 - Thermal Activation of Deep Oxygen Defect Formation and Hydrogen Effusion in Hydrogenated Nanocrystalline Silicon Thin Films

AU - NREL, null

PY - 2011

Y1 - 2011

U2 - 10.1109/pvsc.2011.6186574

DO - 10.1109/pvsc.2011.6186574

M3 - Paper

SP - 2995

EP - 3000

T2 - 37th IEEE Photovoltaic Specialists Conference (PVSC '11)

Y2 - 19 June 2011 through 24 June 2011

ER -