Thermally-Induced Instabilities and the Staebler-Wronski Effect in Doped Amorphous Silicon

Thermally-Induced Instabilities and the Staebler-Wronski Effect in Doped Amorphous Silicon

Research output: Contribution to conference › Paper

Original language	American English
Pages	179-184
Number of pages	6
State	Published - 1987
Event	International Conference on Stability of Amorphous Silicon Alloy Materials and Devices - Palo Alto, California Duration: 28 Jan 1987 → 30 Jan 1987

Conference

Conference	International Conference on Stability of Amorphous Silicon Alloy Materials and Devices
City	Palo Alto, California
Period	28/01/87 → 30/01/87

Bibliographical note

Work performed by Xerox Palo Alto Research Center, Palo Alto, California

NREL Publication Number

ACNR/CP-8724

Cite this

@conference{9c1029d1a0c142aeac861e9475f0ca4f,

title = "Thermally-Induced Instabilities and the Staebler-Wronski Effect in Doped Amorphous Silicon",

author = "NREL",

note = "Work performed by Xerox Palo Alto Research Center, Palo Alto, California; International Conference on Stability of Amorphous Silicon Alloy Materials and Devices ; Conference date: 28-01-1987 Through 30-01-1987",

year = "1987",

language = "American English",

pages = "179--184",

}

TY - CONF

T1 - Thermally-Induced Instabilities and the Staebler-Wronski Effect in Doped Amorphous Silicon

AU - NREL, null

N1 - Work performed by Xerox Palo Alto Research Center, Palo Alto, California

PY - 1987

Y1 - 1987

M3 - Paper

SP - 179

EP - 184

T2 - International Conference on Stability of Amorphous Silicon Alloy Materials and Devices

Y2 - 28 January 1987 through 30 January 1987

ER -