Thin-Film Module Measurement Artifacts

I. L. Eisgruber

doi:10.1109/PVSC.1996.564256

Thin-Film Module Measurement Artifacts

I. L. Eisgruber

Colorado State University

Research output: Contribution to conference › Paper › peer-review

Abstract

A number of artifacts that affect the accuracy and meaning of characterization may be apparent in thin-film module measurements. Such artifacts are often negligible for small single thin-film cells or even single-crystal modules. Possible artifacts include artificially high or low cell series resistances during current-voltage measurements, artificially low quantum efficiencies, artificially low module currents or cell voltages, and misleading signals from selective illumination measurements.

Original language	American English
Pages	829-832
Number of pages	4
DOIs	https://doi.org/10.1109/PVSC.1996.564256 https://doi.org/10.1109/pvsc.1996.564256
State	Published - 1996
Externally published	Yes
Event	Twenty Fifth IEEE Photovoltaic Specialists Conference - Washington, D.C. Duration: 13 May 1996 → 17 May 1996

Conference

Conference	Twenty Fifth IEEE Photovoltaic Specialists Conference
City	Washington, D.C.
Period	13/05/96 → 17/05/96

Bibliographical note

Work performed by Colorado State University, Fort Collins, Colorado

NREL Publication Number

NREL/CP-22410

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Cite this

@conference{b3326cc56db54dafadc0cf5988800977,

title = "Thin-Film Module Measurement Artifacts",

abstract = "A number of artifacts that affect the accuracy and meaning of characterization may be apparent in thin-film module measurements. Such artifacts are often negligible for small single thin-film cells or even single-crystal modules. Possible artifacts include artificially high or low cell series resistances during current-voltage measurements, artificially low quantum efficiencies, artificially low module currents or cell voltages, and misleading signals from selective illumination measurements.",

author = "Eisgruber, {I. L.}",

note = "Work performed by Colorado State University, Fort Collins, Colorado; Twenty Fifth IEEE Photovoltaic Specialists Conference ; Conference date: 13-05-1996 Through 17-05-1996",

year = "1996",

doi = "10.1109/PVSC.1996.564256",

language = "American English",

pages = "829--832",

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TY - CONF

T1 - Thin-Film Module Measurement Artifacts

AU - Eisgruber, I. L.

N1 - Work performed by Colorado State University, Fort Collins, Colorado

PY - 1996

Y1 - 1996

N2 - A number of artifacts that affect the accuracy and meaning of characterization may be apparent in thin-film module measurements. Such artifacts are often negligible for small single thin-film cells or even single-crystal modules. Possible artifacts include artificially high or low cell series resistances during current-voltage measurements, artificially low quantum efficiencies, artificially low module currents or cell voltages, and misleading signals from selective illumination measurements.

AB - A number of artifacts that affect the accuracy and meaning of characterization may be apparent in thin-film module measurements. Such artifacts are often negligible for small single thin-film cells or even single-crystal modules. Possible artifacts include artificially high or low cell series resistances during current-voltage measurements, artificially low quantum efficiencies, artificially low module currents or cell voltages, and misleading signals from selective illumination measurements.

UR - http://www.scopus.com/inward/record.url?scp=0030415278&partnerID=8YFLogxK

U2 - 10.1109/PVSC.1996.564256

DO - 10.1109/PVSC.1996.564256

M3 - Paper

AN - SCOPUS:0030415278

SP - 829

EP - 832

T2 - Twenty Fifth IEEE Photovoltaic Specialists Conference

Y2 - 13 May 1996 through 17 May 1996

ER -

Thin-Film Module Measurement Artifacts

Abstract

Conference

Bibliographical note

NREL Publication Number

Access to Document

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