Abstract
We present a new device structure for a high efficiency, thin-film, silicon solar cell. A preliminary design and an approach for fabrication of such a cell are discussed. The cell structure uses interface texturing and a back surface reflector for effective light trapping. A theoretical analysis is applied to determine the major parameters of the cell. These anlyses indicate that a cellefficiency of about 18% is attainable with a Si film thickness of 10-15.mu.m, and a grain size of about 50.mu.m. A method for making a large-grain thin cell is proposed.
Original language | American English |
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Pages | 101-106 |
Number of pages | 6 |
State | Published - 1998 |
Event | Thin-Film Structures for Photovoltaics: Materials Research Society Symposium - Boston, Massachusetts Duration: 2 Dec 1997 → 5 Dec 1997 |
Conference
Conference | Thin-Film Structures for Photovoltaics: Materials Research Society Symposium |
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City | Boston, Massachusetts |
Period | 2/12/97 → 5/12/97 |
NREL Publication Number
- NREL/CP-520-23208