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Tin Nitride Atomic Layer Deposition Using N2H4
Ann Greenaway
,
Sarah Shulda
,
Elisa Link
, Adele Tamboli
, Steven Christensen
Materials Science
Chemistry and Nanoscience
Research output
:
NLR
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Poster
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Material Science
Tin
100%
Film
100%
Nitride Compound
100%
Silicon Nitride
40%
Oxynitride
40%
Anode
20%
Reflectivity
20%
Chemical Vapor Deposition
20%
Vapor Phase Deposition
20%
Solid State Battery
20%
Anode Materials for Batteries
20%
Oxide Compound
20%
Hydrogen Peroxide
20%
Crystal Structure
20%