Triple-Period Partial Misfit Dislocations at the InN/GaN (0001) Interface: A New Dislocation Core Structure for III-N Materials

Lixin Zhang, W. E. McMahon, Y. Liu, Y. Cai, M. H. Xie, N. Wang, S. B. Zhang

Research output: Contribution to journalArticlepeer-review

4 Scopus Citations

Abstract

The lattice-misfit InN/GaN (0001) interface supports a triangular network of α-core 90° partial misfit dislocations. These misfit dislocations provide excellent strain relief. However, in their unreconstructed form the dislocation contains numerous high-energy N dangling bonds, which must be eliminated by reconstructing the dislocation core. Existing single-period (SP) and double-period (DP) dislocation reconstruction models eliminate these dangling bonds via a like-atom dimerization, such as N-N dimers. However, we show that these N-N dimers are unstable for the III-N materials, so an entirely new reconstruction mechanism is needed. A "triple-period" (TP) structural model is developed which eliminates N dangling bonds via the formation of N vacancies instead of N-N dimers. The model contains no N-N (or III-III) bonds, fully bonds all N atoms to four group-III neighboring atoms, and satisfies the "electron counting rule" by transferring charge from In dangling bonds to Ga dangling bonds.

Original languageAmerican English
Pages (from-to)1728-1738
Number of pages11
JournalSurface Science
Volume606
Issue number21-22
DOIs
StatePublished - Nov 2012

NREL Publication Number

  • NREL/JA-5200-55975

Keywords

  • Ab initio calculations
  • InN/GaN(111)
  • Misfit dislocations
  • Reconstruction
  • Scanning tunneling microscopy

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