Two-Step Annealing of Hot Wire Chemical Vapor Deposited a-Si:H Films

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Original language	American English
Pages (from-to)	418-423
Number of pages	6
Journal	Journal of Materials Science: Materials in Electronics
Volume	19
Issue number	5
DOIs	https://doi.org/10.1007/s10854-007-9358-6
State	Published - 2008

NLR Publication Number

@article{e09fe68fa3f04107888be8cb43e27f9e,

title = "Two-Step Annealing of Hot Wire Chemical Vapor Deposited a-Si:H Films",

keywords = "hot wire chemical vapor depostion, thin films",

author = "\{Reedy Jr.\}, Robert",

year = "2008",

doi = "10.1007/s10854-007-9358-6",

language = "American English",

volume = "19",

pages = "418--423",

journal = "Journal of Materials Science: Materials in Electronics",

issn = "0957-4522",

publisher = "Springer New York",

number = "5",

}

TY - JOUR

T1 - Two-Step Annealing of Hot Wire Chemical Vapor Deposited a-Si:H Films

AU - Reedy Jr., Robert

PY - 2008

Y1 - 2008

KW - hot wire chemical vapor depostion

KW - thin films

U2 - 10.1007/s10854-007-9358-6

DO - 10.1007/s10854-007-9358-6

M3 - Article

SN - 0957-4522

VL - 19

SP - 418

EP - 423

JO - Journal of Materials Science: Materials in Electronics

JF - Journal of Materials Science: Materials in Electronics

IS - 5

ER -