Understanding Hydrogen Passivation Mechanism in Poly-Si Passivating Contacts: Insights from Effusion Studies

Suchismita Mitra, Matthew Hartenstein, Harvey Guthrey, William Nemeth, Steve Harvey, David Young, Sumit Agarwal, Paul Stradins

Research output: NRELPoster

Abstract

Silicon PV is the dominant PV technology, and captures >95% world market share, supporting -100 GW/year. Diffused and passivated pn junctions along with other rear side passivation technologies are the mainstream technologies and will continue to remain so in the coming decades. Passivated contacts, using tunnel oxide passivation stacks at the rear side, will gain market share from about 10% in 2022 up to 58% within the next 10 years. Most mature approaches use passivating layers of hydrogenated Al2O3 and SiNx. LPCVD SiNx provides less hydrogen for passivation compared to PECVD SiNx but can retain the hydrogen up to higher temperatures which is beneficial for firing. Although SiNx provides large amount of hydrogen, this doesn't necessarily translate to good passivation. AlOx:H contributes to retaining H at higher temperatures. Water molecules are also detected during H-effusion and may play a role in passivation of the oxide/wafer interface.
Original languageAmerican English
StatePublished - 2023

Publication series

NamePresented at 30th Annual NREL Silicon Workshop, 30 July - 2 August 2023, Breckenridge, Colorado

NREL Publication Number

  • NREL/PO-5900-87261

Keywords

  • effusion study
  • hydrogen passivation
  • LPCVD
  • passivating contacts
  • PECVD
  • photovoltaic
  • poly-Si
  • PV

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