Abstract
Nanopatterned substrates provide opportunities for reducing costs of high-efficiency III-V devices through methods such as substrate reuse and growth on cheaper substrates. In this work, we aim to better understand some of the fundamental challenges of growing high quality III-V material on nanopatterned substrates. Through specific pattern orientations and control of overgrowth morphology, we report that smooth and defect-free coalesced III-V epilayers are attainable over nanopatterned GaAs substrates.
| Original language | American English |
|---|---|
| Pages | 1377-1378 |
| Number of pages | 2 |
| DOIs | |
| State | Published - 20 Jun 2021 |
| Event | 48th IEEE Photovoltaic Specialists Conference, PVSC 2021 - Fort Lauderdale, United States Duration: 20 Jun 2021 → 25 Jun 2021 |
Conference
| Conference | 48th IEEE Photovoltaic Specialists Conference, PVSC 2021 |
|---|---|
| Country/Territory | United States |
| City | Fort Lauderdale |
| Period | 20/06/21 → 25/06/21 |
Bibliographical note
Publisher Copyright:© 2021 IEEE.
NLR Publication Number
- NREL/CP-5900-78961
Keywords
- coalescence
- defect characterization
- III-V
- nanopatterned substrates
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