Understanding Microscopic Mechanisms of LeTID and LID and their Unifying Features by Electron Paramagnetic Resonance

Abigail Meyer, P. Craig Taylor, Chirag Mule, Sumit Agarwal, Paul Stradins

Research output: NRELPresentation

Abstract

LID degradation involves not only creation of ~ 10^12 cm^-3 recombination centers, but also ~ 10^16 cm^-3 shallow negative-U traps. In Ga-doped Si, LID EPR defects don't appear, but some traps are still created. LeTID: Si DB and H-hyperfine EPR signatures. We postulate that the defect responsible for LeTID is a partially hydrogenated (multivacancy) with a Si dangling bond and H in the vicinity. O involvement is possible yet unclear. We prove that H is related to the structure of the LeTID defect with isotope experiments and its EPR signal is comparable and linear with the Si DB signal upon LeTID degradation. Working on simulating these results with DFT to obtain more detailed defect structure.
Original languageAmerican English
Number of pages14
StatePublished - 2022

Publication series

NamePresented at the 33rd International Photovoltaic Science and Engineering Conference (PVSEC-33), 13-17 November 2022, Nagoya, Japan

NREL Publication Number

  • NREL/PR-5900-84540

Keywords

  • Cz Si
  • dangling bond
  • electron paramagnetic resonance
  • EPR
  • Ga-doped
  • hydrogen hyperfine
  • LeTID
  • LID
  • light- and elevated temperature-induced degradation
  • light-induced degradation
  • photovoltaic
  • PV

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