Abstract
Microcrystalline silicon (..mu..c-Si) p-layers have been widely used in amorphous silicon (a-Si) solar cell research and manufacturing to achieve record high solar cell efficiency. In order to further improve the solar cell performance and achieve wider parameter windows for the process conditions, we studied the deposition of high quality ..mu..c-Si p-layer material using a very high frequency(VHF) plasma enhanced CVD process. A design of experiment (DOE) approach was used for the exploration and optimization of deposition parameters. The usage of DOE leads to a quick optimization of the deposition process within a short time frame. In addition, by using a modified VHF deposition process, we have improved the solar cell blue response which leads to a 6 - 10 percent improvement in thesolar cell efficiency. Such an improvement is likely due to an improved microcrystalline formation in the p-layer.
| Original language | American English |
|---|---|
| Pages | 795-806 |
| Number of pages | 12 |
| State | Published - 1997 |
| Event | Amorphous and Microcrystalline Silicon Technology 1997: Materials Research Society Symposium - San Francisco, California Duration: 31 Mar 1997 → 4 Apr 1997 |
Conference
| Conference | Amorphous and Microcrystalline Silicon Technology 1997: Materials Research Society Symposium |
|---|---|
| City | San Francisco, California |
| Period | 31/03/97 → 4/04/97 |
Bibliographical note
Work performed by Energy Conversion Devices, Inc., Troy, Michigan and United Solar Systems Corp, Troy, MichiganNREL Publication Number
- NREL/CP-520-24565