VHF Plasma Deposition of mu zeta-Si p-Layer Materials

Research output: Contribution to conferencePaper

Abstract

Microcrystalline silicon (..mu..c-Si) p-layers have been widely used in amorphous silicon (a-Si) solar cell research and manufacturing to achieve record high solar cell efficiency. In order to further improve the solar cell performance and achieve wider parameter windows for the process conditions, we studied the deposition of high quality ..mu..c-Si p-layer material using a very high frequency(VHF) plasma enhanced CVD process. A design of experiment (DOE) approach was used for the exploration and optimization of deposition parameters. The usage of DOE leads to a quick optimization of the deposition process within a short time frame. In addition, by using a modified VHF deposition process, we have improved the solar cell blue response which leads to a 6 - 10 percent improvement in thesolar cell efficiency. Such an improvement is likely due to an improved microcrystalline formation in the p-layer.
Original languageAmerican English
Pages795-806
Number of pages12
StatePublished - 1997
EventAmorphous and Microcrystalline Silicon Technology 1997: Materials Research Society Symposium - San Francisco, California
Duration: 31 Mar 19974 Apr 1997

Conference

ConferenceAmorphous and Microcrystalline Silicon Technology 1997: Materials Research Society Symposium
CitySan Francisco, California
Period31/03/974/04/97

Bibliographical note

Work performed by Energy Conversion Devices, Inc., Troy, Michigan and United Solar Systems Corp, Troy, Michigan

NREL Publication Number

  • NREL/CP-520-24565

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