Window Cleaning and Fluorine Incorporation by XeF2 in Photo-CVD

Research output: Contribution to journal › Article

Original language	American English
Pages (from-to)	437-442
Number of pages	6
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	7
Issue number	3
DOIs	https://doi.org/10.1116/1.584766
State	Published - 1989

NREL Publication Number

@article{254496a603db4c09b025e6b3debb3804,

title = "Window Cleaning and Fluorine Incorporation by XeF2 in Photo-CVD",

author = "NREL",

year = "1989",

doi = "10.1116/1.584766",

language = "American English",

volume = "7",

pages = "437--442",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "0734-211X",

publisher = "AVS Science and Technology Society",

number = "3",

}

TY - JOUR

T1 - Window Cleaning and Fluorine Incorporation by XeF2 in Photo-CVD

AU - NREL, null

PY - 1989

Y1 - 1989

U2 - 10.1116/1.584766

DO - 10.1116/1.584766

M3 - Article

SN - 0734-211X

VL - 7

SP - 437

EP - 442

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 3

ER -