X-Ray Photoelectron Spectroscopy Investigation of O Impurity Chemistry in CdS Thin Films Grown By Chemical Bath Deposition

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    Abstract

    We used x-ray photoelectron spectroscopy to investigate the chemistry of O impurity atoms in CdS thin films grown for photovoltaic purposes by chemical-bath deposition (CBD). We compared the Cd 3d photoline, O 1s photoline, Cd MNN Auger line, and O KLL Auger line taken from a CBD CdS thin film, CdS single-crystal reference, Cd metal reference, CdO reference, and Cd(OH)2 reference. This comparisonshowed that the O present in thin-film CBD CdS is a manifestation of H2O incorporated into the film during the CBD growth. Ar+ ion sputtering, a technique frequently used in thin-film analyses, preferentially removed S from the CBD CdS thin film and created CdS1-xOx (x.approx.0.04) in the surface region from the incorporated O impurity.
    Original languageAmerican English
    Pages (from-to)1978-1984
    Number of pages7
    JournalJournal of Applied Physics
    Volume81
    Issue number4
    DOIs
    StatePublished - 1997

    NREL Publication Number

    • NREL/JA-412-21695

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