X-ray Photoelectron Spectroscopy Study of Al- and N- Co-Doped p-Type ZnO Thin Films

G. D. Yuan, Z. Z. Ye, J. Y. Huang, Z. P. Zhu, C. L. Perkins, S. B. Zhang

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Abstract

The chemical state of nitrogen, aluminum, oxygen and zinc in Al-N co-doped p-type ZnO thin films was investigated by X-ray photoelectron spectroscopy (XPS). N1s peak were detected in both the two p-type ZnO thin films, showing two components. The higher binding energy peak may be due to the Al-NO-H species, and the lower one perhaps derive from the (NH2)- cluster for the ammonia introduction. These two peaks both contribute to the p-type behavior in the ZnO films. A symmetry 74.4 eV binding energy in Al2p3/2 photoelectron peaks revealed an Al-N bonding state, a key factor to the co-doping method.

Original languageAmerican English
Pages (from-to)2341-2344
Number of pages4
JournalJournal of Crystal Growth
Volume311
Issue number8
DOIs
StatePublished - 2009

NREL Publication Number

  • NREL/JA-520-46136

Keywords

  • A1. Electrical properties
  • A1. X-ray photoelectron spectroscopy
  • A1. ZnO
  • Al- and N- co-doping

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